462993

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462993

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Methylsilane

electronic grade, ≥99.9%

CAS Number:992-94-9
Linear Formula:CH3SiH3
Molecular Weight:46.14
Beilstein Registry Number:1730728
EC Number:213-598-5
MDL number:MFCD00053655
PubChem Substance ID:24869881

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Description

Packaging10, 20 g in ss cyl
Features and BenefitsPrecursor to silicon carbide or alloy thin films by chemical vapor deposition (CVD) and molecular beam epitaxy (MBE).
 Methylsilane is used in the plasma-assisted CVD of silicon carbide (SiC) and as a precursor to the epitaxial growth of SiGeC alloy layers via rapid thermal CVD.1 Recent developments include the use of methylsilane as a precursor to silicon-carbon-hydrogen polymer used as photoresists.
Recommended productsStainless steel regulators Z527416 or Z527424 are recommended.

Properties

gradeelectronic grade
vapor density0.628 (−58 °C, vs air)
assay≥99.9%
formliquid
total impurities<10 ppm Carbon dioxide (CO2)
 <10 ppm Nitrogen (N2)
 <100 ppm Dimethylsilane (CH3)2SiH2
 <100 ppm Methylchlorosilane CH3SiH2Cl
 <2 ppm Argon + Oxygen (Ar + O2)
 <50 ppm Methane (CH4)
 <50 ppm Silane (SiH4)
bp−57 °C(lit.)
mp−157 °C(lit.)

Safety

Hazard CodesF+,Xn
Risk Statements12-14-20/21
Safety Statements16-24-26-36/37/39
RIDADRUN 3161 2.1
WGK Germany1

References

Cited Reference1. Mi, J. et. al. J. Vac. Sci. Technol. B 14, 1660, (1996)
BeilsteinBeil. 4,IV,3873